晶圆片背面涂布的网版和网版印刷工艺

M. Whitmore, J. Schake
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引用次数: 0

摘要

传统上,模板印刷设备用于表面贴装组装行业的锡膏印刷。近年来,该工具的灵活性已被用于广泛的材料和工艺,以帮助半导体封装和组装。其中一个应用是在硅片背面沉积粘合剂涂层。本文研究了两种完全不同的环氧树脂材料在硅片非活性侧的应用,一种提供可b级的模具附着层,另一种提供保护性的激光标记覆盖层,旨在保护单个模具在切割过程中免受损坏。用两种商业标准的不导电环氧基材料进行了印刷试验。对于每种材料,打印了24个200mm晶圆。对每种材料的丝网和网版印刷工艺进行了比较。同时考虑了印刷工艺参数的影响。涂层厚度、平面度是涂层工艺成功与否的关键指标。对于每个晶圆,至少要进行16次厚度测量。给出了厚度控制性能的实验结果。研究表明,涂层共面度可达到±12.5μm @ 6 σ控制,固化厚度可降至30μm。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Screen and stencil printing processes for wafer backside coating
Stencil printing equipment has traditionally been used in the surface mount assembly industry for solder paste printing. In recent years the flexibility of the tool has been exploited for a wide range of materials and processes to aid semiconductor packaging and assembly. One such application has been the deposition of adhesive coatings onto the backside of silicon wafers. This paper looks at the application of two totally different epoxy materials to the non active side of silicon wafers one providing a B-stageble die attach layer and one providing a protective laser-markable cover layer aimed at protecting individual die from damage during dicing. Printing trials, with the two commercially standard, non-conductive epoxy based materials were conducted. For each material, 24 200mm wafers were printed. Both screen and stencil printing processes were compared for each material. Effects of printing process parameters were also considered. Coating thickness planarity across a wafer is the key metric for a successful coating process. For each wafer processed a minimum of 16 thickness measurements were made. Results showing thickness control capability are presented. The study demonstrates that coating co-planarity accomplishing ±12.5μm @ 6 sigma control with cured thickness's down to 30μm is possible.
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