ZnMgO薄膜的生长及紫外探测器的应用

International Conference on Thin Film Physics and Applications Pub Date : 2010-10-11 DOI:10.1117/12.888372

K. Tang, Jian Huang, Qinkai Zeng, Jijun Zhang, Wei-min Shi, Yiben Xia, Linjun Wang

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引用次数: 0

摘要

采用不同溅射功率的MgO靶材在独立金刚石(FSD)衬底上共溅射制备了ZnMgO薄膜。研究了MgO靶材溅射功率对ZnMgO薄膜性能的影响。ZnMgO薄膜的PL谱显示，ZnMgO的带隙与靶材的溅射功率近似成线性关系。ZnMgO薄膜也被用于制作紫外探测器。最后，对紫外探测器的光电性能进行了研究。

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Growth and UV detectors application of ZnMgO films

ZnMgO films were prepared at room temperature on freestanding diamond (FSD) substrates by co-sputtering with different sputtering power of MgO target. The effect of sputtering power of MgO target on the property of ZnMgO films was investigated. The PL spetra of ZnMgO films revealed that the bandgap of ZnMgO was approximately linear related to the sputtering power of MgO target. The ZnMgO film was also applied to be fabricating UV detectors. Finally, we studied the photoelectric property of the UV detector.

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International Conference on Thin Film Physics and Applications

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