减少光刻中静电相关缺陷

International Symposium on Semiconductor Manufacturing, Extended Abstracts of ISSM Pub Date : 1994-06-21 DOI:10.1109/ISSM.1994.729449

A. Steinman

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引用次数: 3

摘要

在各种洁净室环境中，静电控制失败会产生问题。这在光刻领域尤其明显，因为产品晶圆和光刻线都有受到静电影响的风险。本文介绍了静电控制在光刻领域和使用空气电离为此目的。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Reducing Electrostatic Related Defects In Photolithography

Failure to control static charge creates problems in a variety of cleanroom environments. This is particularly apparent in photolithography areas where both the product wafers and the reticles are at risk to the effects of static charge. This paper presents an introduction to static charge control in photolithography areas and the use of air ionization for this purpose.

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International Symposium on Semiconductor Manufacturing, Extended Abstracts of ISSM

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