{"title":"一种求解MANOS器件中电荷输运方程的新算法,包括氧化铝中的电荷捕获和温度效应","authors":"A. Padovani, L. Larcher","doi":"10.1109/SISPAD.2010.5604519","DOIUrl":null,"url":null,"abstract":"We present a new algorithm for the exact solution of the system of equations describing charge trapping and transport across the dielectric stack of nitride-based charge trapping memories. The algorithm is implemented in a physical MANOS model accounting for temperature effects and charge trapping into the Al2O3 blocking layer. The model reproduces threshold voltage shifts measured at different temperatures on different MANOS stacks.","PeriodicalId":331098,"journal":{"name":"2010 International Conference on Simulation of Semiconductor Processes and Devices","volume":"50 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2010-10-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"9","resultStr":"{\"title\":\"A novel algorithm for the solution of charge transport equations in MANOS devices including charge trapping in alumina and temperature effects\",\"authors\":\"A. Padovani, L. Larcher\",\"doi\":\"10.1109/SISPAD.2010.5604519\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We present a new algorithm for the exact solution of the system of equations describing charge trapping and transport across the dielectric stack of nitride-based charge trapping memories. The algorithm is implemented in a physical MANOS model accounting for temperature effects and charge trapping into the Al2O3 blocking layer. The model reproduces threshold voltage shifts measured at different temperatures on different MANOS stacks.\",\"PeriodicalId\":331098,\"journal\":{\"name\":\"2010 International Conference on Simulation of Semiconductor Processes and Devices\",\"volume\":\"50 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2010-10-14\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"9\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2010 International Conference on Simulation of Semiconductor Processes and Devices\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/SISPAD.2010.5604519\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2010 International Conference on Simulation of Semiconductor Processes and Devices","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SISPAD.2010.5604519","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
A novel algorithm for the solution of charge transport equations in MANOS devices including charge trapping in alumina and temperature effects
We present a new algorithm for the exact solution of the system of equations describing charge trapping and transport across the dielectric stack of nitride-based charge trapping memories. The algorithm is implemented in a physical MANOS model accounting for temperature effects and charge trapping into the Al2O3 blocking layer. The model reproduces threshold voltage shifts measured at different temperatures on different MANOS stacks.