具有动态泄漏的高k/金属栅堆MOS电容等效电路模型

C. Sohn, E. Jeong, H. Sagong, D. Choi, Min-Sang Park, C. Kang, Jinyong Chung, Y. Jeong
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引用次数: 0

摘要

本文提出了一个简单的等效电路模型来表征具有高k介电常数的MOS电容的栅极阻抗,该电容具有明显的动态泄漏。为了考虑高k介电介质中电荷捕获的影响,增加了一系列rc分流器。从我们的模型中发现,使用兆赫范围的双频方法可以得到合理的门电容值,因为具有大时间常数的陷阱无法响应调制频率。并对模型的参数进行了系统的分析。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
An equivalent circuit model for high-k/metal gate stack MOS capacitor with dynamic leakage
This paper presents a simple equivalent circuit model to characterize a gate impedance of MOS capacitor with high-k dielectric, which exhibited significant dynamic leakage. Series of RC-shunts was added to consider the effects of charge trapping in high-k dielectric. From our model, it is found that two-frequency method using the megahertz range gives us reasonable values for the gate capacitance because the traps with large time constants are unable to response the modulating frequency. Also, parameters for our model are systematically analyzed.
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