{"title":"工艺变化对2.4 GHz 90 nm CMOS LNA的影响分析","authors":"J. L. G. Rios, J. C. Cruz, D. Vázquez, A. Rueda","doi":"10.1109/LASCAS.2013.6519087","DOIUrl":null,"url":null,"abstract":"This work presents the analysis of a 90 nm CMOS LNA under process variations. The main parameters charactering the performance of this kind of devices are analyzed. It shows how the performance degradation is mainly derived from the resonant frequency shifting due to the output matching passive network. A way to partially compensate the degradation is presented. Preliminary results are shown.","PeriodicalId":190693,"journal":{"name":"2013 IEEE 4th Latin American Symposium on Circuits and Systems (LASCAS)","volume":"26 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2013-05-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"Analysis of process variations' impact on a 2.4 GHz 90 nm CMOS LNA\",\"authors\":\"J. L. G. Rios, J. C. Cruz, D. Vázquez, A. Rueda\",\"doi\":\"10.1109/LASCAS.2013.6519087\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This work presents the analysis of a 90 nm CMOS LNA under process variations. The main parameters charactering the performance of this kind of devices are analyzed. It shows how the performance degradation is mainly derived from the resonant frequency shifting due to the output matching passive network. A way to partially compensate the degradation is presented. Preliminary results are shown.\",\"PeriodicalId\":190693,\"journal\":{\"name\":\"2013 IEEE 4th Latin American Symposium on Circuits and Systems (LASCAS)\",\"volume\":\"26 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2013-05-23\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2013 IEEE 4th Latin American Symposium on Circuits and Systems (LASCAS)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/LASCAS.2013.6519087\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2013 IEEE 4th Latin American Symposium on Circuits and Systems (LASCAS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/LASCAS.2013.6519087","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Analysis of process variations' impact on a 2.4 GHz 90 nm CMOS LNA
This work presents the analysis of a 90 nm CMOS LNA under process variations. The main parameters charactering the performance of this kind of devices are analyzed. It shows how the performance degradation is mainly derived from the resonant frequency shifting due to the output matching passive network. A way to partially compensate the degradation is presented. Preliminary results are shown.