减法制造技术对超宽带天线散射参数的影响

Peter Lukacs, I. Vehec, T. Lenger
{"title":"减法制造技术对超宽带天线散射参数的影响","authors":"Peter Lukacs, I. Vehec, T. Lenger","doi":"10.1109/ISSE54558.2022.9812756","DOIUrl":null,"url":null,"abstract":"The paper investigates the effect of commonly used subtractive manufacturing technologies on the scattering parameter of an Ultra-WideBand (UWB) antenna that was designed, realized, and measured. As a result, the conventional copper layer etching method using two chemical solutions based on ferric chloride and hydrochloric acid, as well as the Computer Numerical Control (CNC) machining, are critically analyzed. As proven by the obtained results, the etchant, its temperature, and the etching time has a direct effect on the quality of the realized UWB antenna’s edges. Along with the scattering parameter of the antenna, the cross sections’ analysis of the quality of the edges is presented. The Printed Circuit Board (PCB) with the copper layer was used in three thicknesses (17.5, 35, and 70 $\\mu$m) for the experiments described in the paper. The polyimide film with a thickness of 50 $\\mu$m was used as the substrate material. Due to the thin polymeric film and the narrow width of the feeding element (330 $\\mu$m), CNC machining is at the limit of its possibilities. Additionally, the paper analyzes the effect of the etching solution’s temperature on the edge quality in the high frequency area.","PeriodicalId":413385,"journal":{"name":"2022 45th International Spring Seminar on Electronics Technology (ISSE)","volume":"83 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2022-05-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"The Effect of Subtractive Manufacturing Technologies on the UWB Antenna’s Scattering Parameter\",\"authors\":\"Peter Lukacs, I. Vehec, T. Lenger\",\"doi\":\"10.1109/ISSE54558.2022.9812756\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The paper investigates the effect of commonly used subtractive manufacturing technologies on the scattering parameter of an Ultra-WideBand (UWB) antenna that was designed, realized, and measured. As a result, the conventional copper layer etching method using two chemical solutions based on ferric chloride and hydrochloric acid, as well as the Computer Numerical Control (CNC) machining, are critically analyzed. As proven by the obtained results, the etchant, its temperature, and the etching time has a direct effect on the quality of the realized UWB antenna’s edges. Along with the scattering parameter of the antenna, the cross sections’ analysis of the quality of the edges is presented. The Printed Circuit Board (PCB) with the copper layer was used in three thicknesses (17.5, 35, and 70 $\\\\mu$m) for the experiments described in the paper. The polyimide film with a thickness of 50 $\\\\mu$m was used as the substrate material. Due to the thin polymeric film and the narrow width of the feeding element (330 $\\\\mu$m), CNC machining is at the limit of its possibilities. Additionally, the paper analyzes the effect of the etching solution’s temperature on the edge quality in the high frequency area.\",\"PeriodicalId\":413385,\"journal\":{\"name\":\"2022 45th International Spring Seminar on Electronics Technology (ISSE)\",\"volume\":\"83 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2022-05-11\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2022 45th International Spring Seminar on Electronics Technology (ISSE)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ISSE54558.2022.9812756\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2022 45th International Spring Seminar on Electronics Technology (ISSE)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISSE54558.2022.9812756","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

摘要

研究了常用的减法制造技术对设计、实现和测量的超宽带天线散射参数的影响。因此,对传统的三氯化铁和盐酸两种化学溶液的铜层蚀刻方法以及计算机数控(CNC)加工进行了批判性分析。结果表明,蚀刻剂、蚀刻温度和蚀刻时间对实现的超宽带天线边缘质量有直接影响。结合天线的散射参数,给出了边缘质量的截面分析。本文所述的实验使用了三种厚度(17.5、35和70 $\mu$m)的带有铜层的印刷电路板(PCB)。衬底材料采用厚度为50 $\mu$m的聚酰亚胺薄膜。由于聚合物薄膜很薄,进给元件的宽度很窄(330 $\mu$m), CNC加工是其可能性的极限。此外,本文还分析了蚀刻液温度对高频区边缘质量的影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
The Effect of Subtractive Manufacturing Technologies on the UWB Antenna’s Scattering Parameter
The paper investigates the effect of commonly used subtractive manufacturing technologies on the scattering parameter of an Ultra-WideBand (UWB) antenna that was designed, realized, and measured. As a result, the conventional copper layer etching method using two chemical solutions based on ferric chloride and hydrochloric acid, as well as the Computer Numerical Control (CNC) machining, are critically analyzed. As proven by the obtained results, the etchant, its temperature, and the etching time has a direct effect on the quality of the realized UWB antenna’s edges. Along with the scattering parameter of the antenna, the cross sections’ analysis of the quality of the edges is presented. The Printed Circuit Board (PCB) with the copper layer was used in three thicknesses (17.5, 35, and 70 $\mu$m) for the experiments described in the paper. The polyimide film with a thickness of 50 $\mu$m was used as the substrate material. Due to the thin polymeric film and the narrow width of the feeding element (330 $\mu$m), CNC machining is at the limit of its possibilities. Additionally, the paper analyzes the effect of the etching solution’s temperature on the edge quality in the high frequency area.
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