S. Bhattacharya, R. Saha, Subhrajit Sikdar, S. Mandal, Chirantan Das, S. Chattopadhyay
{"title":"双步化学浴沉积(CBD/CBD)技术在金属、绝缘和半导体基底上生长zno纳米线的密度和取向研究","authors":"S. Bhattacharya, R. Saha, Subhrajit Sikdar, S. Mandal, Chirantan Das, S. Chattopadhyay","doi":"10.1109/ISDCS49393.2020.9262979","DOIUrl":null,"url":null,"abstract":"In this paper, the impact of various metallic, insulating and semiconducting substrates on the growth of ZnO nanowires is investigated. The nanowire density and its alignment are studied for all of the substrates and it is observed that the substrate with relatively lower lattice mismatch shows higher degree of nanowire density and alignment. The formation of such nanowires is confirmed by performing EDS, XRD and UV-Vis spectrophotometry experiments. The current work may be useful for mass production of highly ordered ZnO-nanowires for numerous applications.","PeriodicalId":177307,"journal":{"name":"2020 International Symposium on Devices, Circuits and Systems (ISDCS)","volume":"66 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2020-03-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Investigation of density and alignment of ZnO-nanowires grown by double-step chemical bath deposition (CBD/CBD) technique on metallic, insulating and semiconducting substrates\",\"authors\":\"S. Bhattacharya, R. Saha, Subhrajit Sikdar, S. Mandal, Chirantan Das, S. Chattopadhyay\",\"doi\":\"10.1109/ISDCS49393.2020.9262979\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this paper, the impact of various metallic, insulating and semiconducting substrates on the growth of ZnO nanowires is investigated. The nanowire density and its alignment are studied for all of the substrates and it is observed that the substrate with relatively lower lattice mismatch shows higher degree of nanowire density and alignment. The formation of such nanowires is confirmed by performing EDS, XRD and UV-Vis spectrophotometry experiments. The current work may be useful for mass production of highly ordered ZnO-nanowires for numerous applications.\",\"PeriodicalId\":177307,\"journal\":{\"name\":\"2020 International Symposium on Devices, Circuits and Systems (ISDCS)\",\"volume\":\"66 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2020-03-04\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2020 International Symposium on Devices, Circuits and Systems (ISDCS)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ISDCS49393.2020.9262979\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2020 International Symposium on Devices, Circuits and Systems (ISDCS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISDCS49393.2020.9262979","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Investigation of density and alignment of ZnO-nanowires grown by double-step chemical bath deposition (CBD/CBD) technique on metallic, insulating and semiconducting substrates
In this paper, the impact of various metallic, insulating and semiconducting substrates on the growth of ZnO nanowires is investigated. The nanowire density and its alignment are studied for all of the substrates and it is observed that the substrate with relatively lower lattice mismatch shows higher degree of nanowire density and alignment. The formation of such nanowires is confirmed by performing EDS, XRD and UV-Vis spectrophotometry experiments. The current work may be useful for mass production of highly ordered ZnO-nanowires for numerous applications.
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