K. Watanabe, H. Nishiyama, M. Noguchi, D. Fujiki, K. Nemoto
{"title":"产量影响评价的实时暗场尺寸测量方法","authors":"K. Watanabe, H. Nishiyama, M. Noguchi, D. Fujiki, K. Nemoto","doi":"10.1109/ISSM.2000.993668","DOIUrl":null,"url":null,"abstract":"A practical method for in-line particle size measurement called real-time dark field size measurement has been developed. Size measurement data possessing a good correlation coefficient (R/sup 2/=0.7) by this method has been acquired using high-sensitivity dark field laser-scanning inspection tools. As a result, it is possible to evaluate yield impact properly even with high-sensitivity dark field laser-scanning inspection tools.","PeriodicalId":104122,"journal":{"name":"Proceedings of ISSM2000. Ninth International Symposium on Semiconductor Manufacturing (IEEE Cat. No.00CH37130)","volume":"67 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2000-09-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Real-time dark field size measurement method for yield impact evaluation\",\"authors\":\"K. Watanabe, H. Nishiyama, M. Noguchi, D. Fujiki, K. Nemoto\",\"doi\":\"10.1109/ISSM.2000.993668\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A practical method for in-line particle size measurement called real-time dark field size measurement has been developed. Size measurement data possessing a good correlation coefficient (R/sup 2/=0.7) by this method has been acquired using high-sensitivity dark field laser-scanning inspection tools. As a result, it is possible to evaluate yield impact properly even with high-sensitivity dark field laser-scanning inspection tools.\",\"PeriodicalId\":104122,\"journal\":{\"name\":\"Proceedings of ISSM2000. Ninth International Symposium on Semiconductor Manufacturing (IEEE Cat. No.00CH37130)\",\"volume\":\"67 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2000-09-26\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings of ISSM2000. Ninth International Symposium on Semiconductor Manufacturing (IEEE Cat. No.00CH37130)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ISSM.2000.993668\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of ISSM2000. Ninth International Symposium on Semiconductor Manufacturing (IEEE Cat. No.00CH37130)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISSM.2000.993668","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Real-time dark field size measurement method for yield impact evaluation
A practical method for in-line particle size measurement called real-time dark field size measurement has been developed. Size measurement data possessing a good correlation coefficient (R/sup 2/=0.7) by this method has been acquired using high-sensitivity dark field laser-scanning inspection tools. As a result, it is possible to evaluate yield impact properly even with high-sensitivity dark field laser-scanning inspection tools.