压力下压缩预应力长膜的对称转变

O. Paul, T. Kramer
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引用次数: 3

摘要

本文报道了长后屈曲膜对压差的力学响应。在无压力条件下,当泊松比/spl nu/=0.25、prestrain /spl epsiv// sub0 /比临界值-17.3 t/sup 2//a/sup 2/时,膜的厚度为t、宽度为a时,膜呈现曲流状后屈曲。随着压力载荷的增加,在临界压力p/sub cr1/(/spl epsiv//sub 0/)下,结构发生二阶过渡,形成波纹形状,在较高临界压力p/sub cr2/(/spl epsiv//sub 0/)下,结构形成无波纹形状。在每一次过渡中,结构获得额外的对称性。在微机械加工的PECVD氮化硅薄膜上对这些现象进行了实验研究。利用变分演算方法,可以计算p/sub cr1/(/spl epsiv//sub 0/)、p/sub cr2/(/spl epsiv//sub 0/)、/spl epsiv//sub 0、cr2/以及对称对膜剖面的贡献。基于数值计算结果,得到PECVD氮化硅薄膜的预应变和弹性模量分别为/spl epsiv//sub 0/=-1.78/spl × /10/sup -3/和E=160 GPa。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Symmetry transitions of compressively prestressed long membranes under pressure
This paper reports on the mechanical response of long postbuckled membranes to differential pressure. In the absence of pressure, membranes with Poisson's ratio /spl nu/=0.25 and prestrain /spl epsiv//sub 0/ more compressive than the critical value -17.3 t/sup 2//a/sup 2/, with the membrane thickness t and width a, show a meander-shaped postbuckling profile. With increasing pressure load, the structures undergo a second-order transition to a ripple-shaped profile at a critical pressure p/sub cr1/(/spl epsiv//sub 0/), and to a ripple-free profile at a higher critical pressure p/sub cr2/(/spl epsiv//sub 0/). At each transition, the structures gain additional symmetries. These phenomena were experimentally studied on micromachined PECVD silicon nitride thin film membranes. A variational calculus approach enabled p/sub cr1/(/spl epsiv//sub 0/), p/sub cr2/(/spl epsiv//sub 0/), /spl epsiv//sub 0,cr2/, and the symmetry contributions to the membrane profiles to be computed. Based on the numerical results, the prestrain and elastic modulus of a PECVD silicon nitride thin film were extracted as /spl epsiv//sub 0/=-1.78/spl times/10/sup -3/ and E=160 GPa, respectively.
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