在保持统计过程控制(SPC)所需灵敏度的同时，能否减少cd的测量量?

The 17th Annual SEMI/IEEE ASMC 2006 Conference Pub Date : 2006-05-22 DOI:10.1109/ASMC.2006.1638769

A. Eidelman, J. Asscher

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引用次数: 1

摘要

在本文中，我们描述了一种方法，确定所需的采样量，以有效的过程控制光刻临界尺寸(cd)使用先进的统计方法。该方法也可用于SPC应用的其他工艺(薄膜，CMP，扩散，ETCH)

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Can You Reduce the Amount of CDs Measured, While Retaining the Required Sensitivity of Statistical Process Control (SPC)?

In this paper, we describe a method of determining the amount of sampling needed for effective process control of photolithographic critical dimensions (CDs) using an advanced statistical approach. This method can also be used for other processes (thin films, CMP, diffusion, ETCH) where SPC is applied

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The 17th Annual SEMI/IEEE ASMC 2006 Conference

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