引进新型“复合释放层刚性载体”,以晶圆和面板的形式组装超高密度的先进封装和基板

Yoshinori Matsuura, T. Yoshida, Yukiko Komiya, Toshimi Nakamura, Takenori Yanai, Kazuhiro Okuyama, Kyohei Kuwahara, Yukiko Kitabatake, Rintaro Ishii, Katsuyuki Hayashi, Takashi Kubota, Joji Fujii, V. B. Dutta
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引用次数: 0

摘要

刚性载体基板对于支持在晶圆和面板上组装先进的超薄高密度封装和模块至关重要。在载体上应用有机粘接-脱粘层,该载体在整个组装过程中保持不变,并在封装组装完成后分离/释放。现在硼硅酸盐玻璃被用作载体材料。随着对先进封装结构的需求,有机键合/脱粘材料已经达到了极限,存在工艺和成品率相关问题。此外,除了使用高成本硼硅玻璃作为载体材料的限制外,还有其他一些与有机键合-脱键释放材料相关的技术问题。本文对这些细节进行了讨论,并介绍了一种替代材料。介绍了一种新型的“复合无机释放层刚性载体”。它克服了目前的组装问题,并有机会降低总制造成本,并提供了几种低成本的刚性基板载体材料。这种新型材料被称为HRDP®(高分辨率可剥离面板),可用于大尺寸晶圆和面板格式。HRDP可作为现有装配流程的直接解决方案。本文介绍了新材料的设置,实现超细线/空间(<1um)的工艺细节,对翘曲和脱粘释放力的影响,化学和热阻结果以及成本比较数据。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Introducing novel “Rigid Carrier with Composite Release Layer” to assemble ultra-high density Advanced Packages & Substrates in wafer and panel format
Rigid carrier substrates are essential to support assembly of advanced ultra-thin high-density packages and modules on wafer and panel format. An organic bonding-debonding layer is applied on the carrier which remains all through assembly and detached/released once package assembly is completed. Today borosilicate glass is used as carrier material. With the need for advanced package architecture, the organic bonding/debonding materials have reached their limits, with process and yield related issues. Further, besides the restriction to use high-cost borosilicate glass as carrier material, there are several other technical issues associated with organic bonding-debonding release material. In this paper these details have been discussed and an alternate material set is described. A new “Rigid carrier with composite inorganic release layer” is introduced. It overcomes the current assembly issues along with the opportunity to reduce total manufacturing cost, with availability of several low-cost rigid substrate carrier materials. This novel material set is referred as HRDP® (High Resolution Debondable Panel) and is available in large size wafer and panel formats. The HRDP serves as a drop-in solution to existing assembly flow. This paper describes the new material set, process details to achieve ultra-fine line/space (<1um), impact on warpage and debonding release force, chemical and thermal resistance results as well as cost comparison data.
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