化学放大电子束带缩醛保护团的抗蚀剂添加剂对抗蚀剂性能的影响

Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387) Pub Date : 2000-07-11 DOI:10.1109/IMNC.2000.872768

S. Saito, N. Kihara, T. Ushirogouchi

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引用次数: 0

摘要

讨论了一种基于缩醛保护聚苯乙烯(PHS)的高灵敏度电子束(EB)正阻片，并提出了一种新的化学放大系统。在该体系中，EB暴露后生成的酸既是脱保护反应的催化剂，也是生水反应的催化剂。该体系使缩醛保护基团与强酸的结合在EB光刻中成为可能。

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Chemically amplified electron beam positive resist with acetal protecting group-effect of the additives on resist properties

We discuss a high-sensitivity electron beam (EB) positive resist based on acetal-protected poly(hydroxystyrene) (PHS) and also propose a new chemical amplification system. In this system, the generated acid after EB exposure acts as the catalyst for the deprotection reaction, as well as the water-generating reaction. This system can make the combination of acetal protecting group and strong acid possible in EB lithography.

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Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387)

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