用于20- 50v电源开关的双凹槽GaAs phemt

V. Pala, M. Hella, T. Chow
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引用次数: 1

摘要

正常off RF pHEMT工艺针对功率开关ic在20-50V范围内的阻塞电压进行了优化。由于其优越的材料特性,pHEMT开关器件的内在性能值比最先进的硅NMOS晶体管提高了一个数量级,与横向GaN hemt相同。在硅基低压功率晶体管的创新已经饱和的情况下,这种方法是打破常规并在性能上取得巨大飞跃的新方法。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Double Recessed GaAs pHEMTs for 20-50 V Power Switching
A normally-OFF RF pHEMT process is optimized for a blocking voltage in the 20-50V range for power switching ICs. Due to their superior material properties, the intrinsic figure of merit for pHEMT switching devices show an order of magnitude improvement over the state-of-the-art Silicon NMOS transistors and in the same range as lateral GaN HEMTs. In a scenario where innovations in silicon based low voltage power transistors have saturated, this approach is a new way of breaking the paradigm and making large leaps in performance.
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