{"title":"用于20- 50v电源开关的双凹槽GaAs phemt","authors":"V. Pala, M. Hella, T. Chow","doi":"10.1109/CSICS.2013.6659223","DOIUrl":null,"url":null,"abstract":"A normally-OFF RF pHEMT process is optimized for a blocking voltage in the 20-50V range for power switching ICs. Due to their superior material properties, the intrinsic figure of merit for pHEMT switching devices show an order of magnitude improvement over the state-of-the-art Silicon NMOS transistors and in the same range as lateral GaN HEMTs. In a scenario where innovations in silicon based low voltage power transistors have saturated, this approach is a new way of breaking the paradigm and making large leaps in performance.","PeriodicalId":257256,"journal":{"name":"2013 IEEE Compound Semiconductor Integrated Circuit Symposium (CSICS)","volume":"28 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2013-11-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Double Recessed GaAs pHEMTs for 20-50 V Power Switching\",\"authors\":\"V. Pala, M. Hella, T. Chow\",\"doi\":\"10.1109/CSICS.2013.6659223\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A normally-OFF RF pHEMT process is optimized for a blocking voltage in the 20-50V range for power switching ICs. Due to their superior material properties, the intrinsic figure of merit for pHEMT switching devices show an order of magnitude improvement over the state-of-the-art Silicon NMOS transistors and in the same range as lateral GaN HEMTs. In a scenario where innovations in silicon based low voltage power transistors have saturated, this approach is a new way of breaking the paradigm and making large leaps in performance.\",\"PeriodicalId\":257256,\"journal\":{\"name\":\"2013 IEEE Compound Semiconductor Integrated Circuit Symposium (CSICS)\",\"volume\":\"28 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2013-11-11\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2013 IEEE Compound Semiconductor Integrated Circuit Symposium (CSICS)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/CSICS.2013.6659223\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2013 IEEE Compound Semiconductor Integrated Circuit Symposium (CSICS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/CSICS.2013.6659223","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Double Recessed GaAs pHEMTs for 20-50 V Power Switching
A normally-OFF RF pHEMT process is optimized for a blocking voltage in the 20-50V range for power switching ICs. Due to their superior material properties, the intrinsic figure of merit for pHEMT switching devices show an order of magnitude improvement over the state-of-the-art Silicon NMOS transistors and in the same range as lateral GaN HEMTs. In a scenario where innovations in silicon based low voltage power transistors have saturated, this approach is a new way of breaking the paradigm and making large leaps in performance.