双光子直接激光书写中元结构诱导的超分辨率

G. Lio, R. Caputo
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引用次数: 0

摘要

双光子直接激光书写(TP-DLW)广泛应用于立体光刻工艺,用于实现复杂的微纳米结构,在流体,光子学和生物医学器件中得到广泛应用。在本章中,详细介绍了如何利用具有特殊光学功能的金属介电元结构来增强通用TP-DLW器件的性能,从而实现高度($15\:nm$)和宽度小至$150\:nm$的超分辨率全介电纳米结构的制造。该结果为实现全介质超平面光学元件开辟了新的领域,其时间明显短于标准耗时的电子和深紫外光刻工艺。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Metastructures-Induced Hyper-Resolution in Two-Photon Direct Laser Writing
Two-photon direct laser writing (TP-DLW) is widely used in stereolithographic processes for realizing sophisticated micro- and nanoscale structures with application in fluidics, photonics, and biomedical devices. In this chapter, it is detailed how leveraging on metal-dielectric metastructures with peculiar optical functionalities is possible to enhance the performance of a generic TP-DLW device, thus enabling the fabrication of all-dielectric nanostructures with hyper-resolution in height ($15\:nm$) and width as small as $150\:nm$. The results open new frontiers toward the realization of all-dielectric ultraflat optical elements in a noticeably shorter time than standard time-consuming electron and deep-UV lithography processes.
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