{"title":"超过摩尔器件的光刻技术和趋势:先进封装和MEMS器件","authors":"A. Pizzagalli","doi":"10.1117/12.2326784","DOIUrl":null,"url":null,"abstract":"Lithography requirements for Advanced Packaging & MEMS are very different compared to mainstream semiconductor industries’ needs. Even if the market entry barrier is much lower in the “More than Moore” market, customer adoptions needs are higher in the packaging area with respect to resolution, overlay, sidewall angle, and depth of focus (DOF), wafer handling for wafer bow and backside alignment. Key technical trends, requirements and challenges regarding the lithography technologies will be addressed in this paper. In addition, more insights on the current and emerging lithography methods for More than Moore devices will be included, as well as market forecast, competitive landscape of the major equipment suppliers addressing these fields.","PeriodicalId":287066,"journal":{"name":"European Mask and Lithography Conference","volume":"36 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2018-09-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":"{\"title\":\"Lithography technology and trends for More than Moore devices: advanced packaging and MEMS devices\",\"authors\":\"A. Pizzagalli\",\"doi\":\"10.1117/12.2326784\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Lithography requirements for Advanced Packaging & MEMS are very different compared to mainstream semiconductor industries’ needs. Even if the market entry barrier is much lower in the “More than Moore” market, customer adoptions needs are higher in the packaging area with respect to resolution, overlay, sidewall angle, and depth of focus (DOF), wafer handling for wafer bow and backside alignment. Key technical trends, requirements and challenges regarding the lithography technologies will be addressed in this paper. In addition, more insights on the current and emerging lithography methods for More than Moore devices will be included, as well as market forecast, competitive landscape of the major equipment suppliers addressing these fields.\",\"PeriodicalId\":287066,\"journal\":{\"name\":\"European Mask and Lithography Conference\",\"volume\":\"36 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2018-09-19\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"4\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"European Mask and Lithography Conference\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1117/12.2326784\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"European Mask and Lithography Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.2326784","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 4
摘要
与主流半导体行业的需求相比,先进封装和MEMS的光刻要求非常不同。即使“超过摩尔”市场的市场准入门槛要低得多,但在封装领域,客户对分辨率、覆盖层、侧壁角度、对焦深度(DOF)、晶圆弯曲和背面对准的晶圆处理等方面的需求更高。本文将讨论光刻技术的主要技术趋势、要求和挑战。此外,还将包括对more more Moore器件当前和新兴光刻方法的更多见解,以及市场预测,解决这些领域的主要设备供应商的竞争格局。
Lithography technology and trends for More than Moore devices: advanced packaging and MEMS devices
Lithography requirements for Advanced Packaging & MEMS are very different compared to mainstream semiconductor industries’ needs. Even if the market entry barrier is much lower in the “More than Moore” market, customer adoptions needs are higher in the packaging area with respect to resolution, overlay, sidewall angle, and depth of focus (DOF), wafer handling for wafer bow and backside alignment. Key technical trends, requirements and challenges regarding the lithography technologies will be addressed in this paper. In addition, more insights on the current and emerging lithography methods for More than Moore devices will be included, as well as market forecast, competitive landscape of the major equipment suppliers addressing these fields.