八面体开槽金属轨道的变形

J. Kludt, K. Weide-Zaage, M. Ackermann, V. Hein
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引用次数: 6

摘要

在集成电路中使用的开槽金属轨道的寿命延长的优势已经被证明。在直流和直流脉冲应力测试条件下,开槽金属轨道几何形状的优点,特别是厚金属轨道,可以通过寿命测量来证实。为了获得更高的电流能力,这些金属轨道,也被称为“动力金属”,被用于上层金属化层。与传统的宽无槽金属轨道相比,这种新的设计概念对电迁移具有更好的稳健性。一个新的概念是在较低的金属化层中使用开槽几何形状。模拟表明,与未开槽的金属轨道相比,von Mises应力减小。这种行为可以减少由于较低金属化层施加的应力而导致的有源和无源器件的电流移位。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Deformation of octahedron slotted metal tracks
The advantage of an increased lifetime of slotted metal tracks for the use in integrated circuits has already been shown. A benefit for slotted metal track geometries especially for thick metal tracks under DC and DC pulsed stress test conditions could be confirmed by lifetime measurements. To achieve a higher current capability these metal tracks, also known as “power metals”, were used in upper metallization layers. This new design concept shows a better robustness towards electromigration in comparison to conventional wide unslotted metal tracks. A new concept deals with the use of slotted geometries in lower metallization layers. Simulations show a decrease of von Mises stress in comparison to unslotted metal tracks. This behaviour can reduce the current shift of active and passive devices due to the imposed stress of the lower metallization layers.
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