{"title":"模拟后端工艺变化对电路性能的影响","authors":"D. Sylvester, O. S. Nakagawa, C. Hu","doi":"10.1109/VTSA.1999.785999","DOIUrl":null,"url":null,"abstract":"We present a stochastic approach to account for on-chip interconnect process variation. A Monte Carlo approach is taken using actual process distributions to generate realistic 3-D performance corners. Accurate analytical models are used to provide a >3 order of magnitude speedup over simulation techniques. Resulting delay and noise performance spreads are 33 to 63% tighter than those found using a conventional technique. We apply this method to a clock distribution network to more precisely determine clock skew.","PeriodicalId":237214,"journal":{"name":"1999 International Symposium on VLSI Technology, Systems, and Applications. Proceedings of Technical Papers. (Cat. No.99TH8453)","volume":"45 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1999-06-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"18","resultStr":"{\"title\":\"Modeling the impact of back-end process variation on circuit performance\",\"authors\":\"D. Sylvester, O. S. Nakagawa, C. Hu\",\"doi\":\"10.1109/VTSA.1999.785999\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We present a stochastic approach to account for on-chip interconnect process variation. A Monte Carlo approach is taken using actual process distributions to generate realistic 3-D performance corners. Accurate analytical models are used to provide a >3 order of magnitude speedup over simulation techniques. Resulting delay and noise performance spreads are 33 to 63% tighter than those found using a conventional technique. We apply this method to a clock distribution network to more precisely determine clock skew.\",\"PeriodicalId\":237214,\"journal\":{\"name\":\"1999 International Symposium on VLSI Technology, Systems, and Applications. Proceedings of Technical Papers. (Cat. No.99TH8453)\",\"volume\":\"45 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1999-06-08\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"18\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"1999 International Symposium on VLSI Technology, Systems, and Applications. Proceedings of Technical Papers. (Cat. No.99TH8453)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/VTSA.1999.785999\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"1999 International Symposium on VLSI Technology, Systems, and Applications. Proceedings of Technical Papers. (Cat. No.99TH8453)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/VTSA.1999.785999","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Modeling the impact of back-end process variation on circuit performance
We present a stochastic approach to account for on-chip interconnect process variation. A Monte Carlo approach is taken using actual process distributions to generate realistic 3-D performance corners. Accurate analytical models are used to provide a >3 order of magnitude speedup over simulation techniques. Resulting delay and noise performance spreads are 33 to 63% tighter than those found using a conventional technique. We apply this method to a clock distribution network to more precisely determine clock skew.