基于CMOS的超低功耗7T SRAM单元设计

Majid Moghaddam, M. H. Moaiyeri, M. Eshghi
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引用次数: 12

摘要

本文介绍了一种能在低电压下良好工作的7T SRAM单元。通过控制漏极诱导势垒降低(DIBL)效应和保持“1”状态的体源电压,提供了合适的读操作结构。所提出的单元的读操作结构利用导致较大写入余量的单晶体管。在90nm TSMC CMOS上的仿真结果表明,与其他最高效的低压SRAM单元相比,所提出的SRAM单元在功耗、写入裕度、对工艺变化的敏感性等方面都具有优异的性能。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Ultra low-power 7T SRAM cell design based on CMOS
In his paper a 7T SRAM cell operating well in low voltages is presented. Suitable read operation structure is provided by controlling the drain induced barrier lowering (DIBL) effect and body-source voltage in the hold `1' state. The read-operation structure of the proposed cell utilizes the single transistor which leads to a larger write margin. The simulation results at 90nm TSMC CMOS demonstrate the outperforms of the proposed SRAM cell in terms of power dissipation, write margin, sensitivity to process variations as compared with the other most efficient low-voltage SRAM cells.
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