相位掩模技术对飞秒激光书写像差的影响

Nurmemet Abdukerim, C. Hnatovsky, D. Grobnic, R. Lausten, Stephen Mihailovt
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引用次数: 0

摘要

通过测量轴向光强分布,研究了相位掩模技术飞秒激光书写中色散和锥形衍射的联合效应。最佳写入距离从相位掩模实验确定。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Effect of Aberrations in Femtosecond Laser Writing Using the Phase Mask Technique
The combined effect of chromatic dispersion and conical diffraction in femtosecond laser writing using the phase mask technique is characterized by measuring the axial intensity distribution. Optimum writing distance from the phase mask is experimentally determined.
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