Nurmemet Abdukerim, C. Hnatovsky, D. Grobnic, R. Lausten, Stephen Mihailovt
{"title":"相位掩模技术对飞秒激光书写像差的影响","authors":"Nurmemet Abdukerim, C. Hnatovsky, D. Grobnic, R. Lausten, Stephen Mihailovt","doi":"10.1109/PN.2019.8819556","DOIUrl":null,"url":null,"abstract":"The combined effect of chromatic dispersion and conical diffraction in femtosecond laser writing using the phase mask technique is characterized by measuring the axial intensity distribution. Optimum writing distance from the phase mask is experimentally determined.","PeriodicalId":448071,"journal":{"name":"2019 Photonics North (PN)","volume":"5 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2019-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Effect of Aberrations in Femtosecond Laser Writing Using the Phase Mask Technique\",\"authors\":\"Nurmemet Abdukerim, C. Hnatovsky, D. Grobnic, R. Lausten, Stephen Mihailovt\",\"doi\":\"10.1109/PN.2019.8819556\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The combined effect of chromatic dispersion and conical diffraction in femtosecond laser writing using the phase mask technique is characterized by measuring the axial intensity distribution. Optimum writing distance from the phase mask is experimentally determined.\",\"PeriodicalId\":448071,\"journal\":{\"name\":\"2019 Photonics North (PN)\",\"volume\":\"5 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2019-05-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2019 Photonics North (PN)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/PN.2019.8819556\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2019 Photonics North (PN)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/PN.2019.8819556","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Effect of Aberrations in Femtosecond Laser Writing Using the Phase Mask Technique
The combined effect of chromatic dispersion and conical diffraction in femtosecond laser writing using the phase mask technique is characterized by measuring the axial intensity distribution. Optimum writing distance from the phase mask is experimentally determined.