< 100 >和< 110 > Si纳米线场效应管的三维多子带集成蒙特卡罗模拟

L. Donetti, C. Sampedro, F. Ruiz, A. Godoy, F. Gámiz
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引用次数: 1

摘要

本文利用三维多子带集成蒙特卡罗模拟器,对通道方向为< 100 >和< 110 >的硅纳米线MOS晶体管进行了全面研究。结果表明,< 100 >取向器件比< 110 >取向器件提供更大的电流和迁移率。从不同谷的居群角度分析和解释了空间电荷分布的差异。最后,进行了缩放分析,直到通道长度为8nm。在这种情况下,两种方向之间观察到的差异是最小的。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
3D multi-subband ensemble Monte Carlo simulation of 〈100〉 and 〈110〉 Si nanowire FETs
This work presents a comprehensive study of MOS transistors based on Si nanowires with 〈100〉 and 〈110〉 channel orientations employing our 3D Multi-Subband Ensemble Monte Carlo simulator. The results show that 〈100〉 oriented devices provide larger current and mobility than their 〈110〉 counterparts. The differences in the spatial charge distribution are analyzed and explained in terms of the population of the different valleys. Finally, a scaling analysis is performed, down to the channel length of 8nm. In this case, the differences observed between both orientations are minimal.
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