R. Nagarajan, M. Diwan, P. Awasthi, A. Shukla, P. Sharma, M. Goodson, S. Awad
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Optimization of Ultrasonic Cleaning for Erosion-Sensitive Microelectronic Components
In this paper, we describe an experimental study undertaken to investigate ultrasonic fields in the frequency range 58-192 kHz with respect to their surface cleaning and erosion potential. Measurements are performed using three different methods - gravimetric weight-loss, surface profilometry, and precision turbidimetry - to assess these mechanisms for a variety of materials, including semiconductors. Conclusions are drawn regarding the nature of interaction between high-frequency, high-intensity ultrasonic fields and immersed surfaces. Recommendations are provided for optimal settings to maximize surface cleanability and minimize erodibility of sensitive substrates
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