{"title":"无机薄膜的拉曼分析*","authors":"D. Tallant, K. Higgins, P. Hargis, A. Stewart","doi":"10.1364/lmd.1987.wa3","DOIUrl":null,"url":null,"abstract":"Techniques for the Raman analysis of plasma-deposited submicrometer silicon films on metallic substrates and dielectric films on Raman-active substrates will be described and typical results will be presented.","PeriodicalId":331014,"journal":{"name":"Topical Meeting on Lasers in Materials Diagnostics","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Raman Analysis of Inorganic Thin Films*\",\"authors\":\"D. Tallant, K. Higgins, P. Hargis, A. Stewart\",\"doi\":\"10.1364/lmd.1987.wa3\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Techniques for the Raman analysis of plasma-deposited submicrometer silicon films on metallic substrates and dielectric films on Raman-active substrates will be described and typical results will be presented.\",\"PeriodicalId\":331014,\"journal\":{\"name\":\"Topical Meeting on Lasers in Materials Diagnostics\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1900-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Topical Meeting on Lasers in Materials Diagnostics\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1364/lmd.1987.wa3\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Topical Meeting on Lasers in Materials Diagnostics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1364/lmd.1987.wa3","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Techniques for the Raman analysis of plasma-deposited submicrometer silicon films on metallic substrates and dielectric films on Raman-active substrates will be described and typical results will be presented.