二十一世纪纳米电子学的挑战

D. Antoniadis
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引用次数: 0

摘要

当今领先的CMOS技术是工业规模纳米级工程的独特例子。当我们庆祝我们行业的这一非凡成就时,我们不禁思考我们如何才能继续推动纳米电子学的发展。随着硅FET缩放的终结越来越接近,在硅和“超越硅”解决方案中寻找更具可扩展性的晶体管结构已成为当务之急;从相对“容易”过渡到非平面硅结构,到结合高迁移率半导体,如Ge和III-V,再到更高迁移率的新材料,如碳纳米管,石墨烯或其他分子结构。更进一步,人们正在寻找新的信息表示和处理概念,而不是在场效应管中电荷,例如在自旋态器件中。当然,宣布硅的死亡还为时过早,考虑到这一点,我将讨论引入新型纳米电子设备的挑战和可能的情况。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Nanoelectronics challenges for the 21st century
Leading edge CMOS technologies today are unique examples of nanoscale engineering at an industrial scale. As we celebrate this remarkable achievement of our industry that forms the ever-expanding technology basis of modern society we cannot help but ponder the question of how we can continue to push the envelope of nano-electronics. With the end of Si FET scaling appearing increasingly near, searching for more scalable transistor structures in Si and in "beyond-Si" solutions has become imperative; from relatively "easy" transitions to non-planar Si structures, to the incorporation of high mobility semiconductors, like Ge and III-V's, to even higher mobility new materials such as carbon nanotubes, graphene, or other molecular structures. And even further, there are searches for new information representation and processing concepts beyond charge in FETs, as for example, in spin-state devices. Of course, declaring silicon dead is premature at best, and with this in mind I will discuss the challenges and possible scenaria for the introduction of novel nano-electronic devices.
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