65nm nMOSFET技术的参数提取从300k降至3.8 K

O. López-L, I. Martinez-R, D. Durini, D. Ferrusca, E. Gutiérrez-D., A. Ortiz-Conde
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引用次数: 1

摘要

在本文中,我们提出了一种在3.8 K至300 K温度范围内提取mosfet参数的方法。该方法只需要在三极管区域的单个测试设备上进行简单的直流测量。提取的参数有:阈值电压、串联电阻、迁移率和载流子达到速度饱和的临界场。我们还表明,在三极管区域,迁移率退化、串联电阻和速度饱和会产生等效的效应。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Parameter extraction in a 65nm nMOSFET technology from 300 K down to 3.8 K
In this article, we present a method to extract the parameters of MOSFETs at temperatures ranging from 3.8 K to 300 K. The method only requires simple DC measurements on a single test device in the triode region. The extracted parameters are: the threshold voltage, the series resistance, the mobility and the critical field at which the carriers are velocity saturated. We also show that mobility degradation, series resistance and velocity saturation produce equivalent effects in the triode region.
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