0.5 ga0.5 as /GaAs量子点的堆叠结构:生长与表征

Z. Othaman, D. Aryanto, A. Ismail, M. Yahya, H. Soetedjo
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引用次数: 0

摘要

利用金属-有机化学气相沉积(MOCVD)技术,制备了不同堆叠数的自组装In0.5Ga0.5As/GaAs量子点(QDs)。高分辨率x射线衍射(HR-XRD)和透射电子显微镜(TEM)表征表明,在GaAs(100)衬底上形成的堆叠自组装In0.5Ga0.5As量子点在垂直方向上排列错位,并且从横截面TEM表征中没有发现明显的缺陷。此外,随着堆叠数的增加,光致发光峰位置发生蓝移,光致发光强度显著增加。PL测量的峰值和强度与堆叠自组装量子点的结构和量子点层数密切相关。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Stacked structures In0.5Ga0.5As/GaAs quantum dots: Growth and characterization
Stacked structures of self-assembled In0.5Ga0.5As/GaAs quantum dots (QDs) have been grown using Metal-Organic Chemical Vapor Deposition (MOCVD) with different number of stacks. High Resolution X-Ray Diffraction (HR-XRD) and Transmission Electron Microscope (TEM) characterization revealed that the formation of stacked self-assembled In0.5Ga0.5As QDs on GaAs (100) substrates were misaligned vertically and no visible defect has been detected from the cross-sectional TEM characterization. In addition, photoluminescence (PL) peak position is blue-shifted and PL intensity dramatically increased with increasing number of stacks. The peak and intensity of the PL measurement strongly depend on the structural of stacked self-assembled QDs and also the number of QDs layers.
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