具有位并行结构的16kb铁电非易失性存储器

R. Womack, Donald E Tolsch
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引用次数: 43

摘要

作者描述了一种实验性的16kb非易失性存储器,每比特使用两个存储单元,每个存储单元使用一个晶体管和一个铁电电容器。RAM尺寸为5mm * 7mm,每比特462 μ m/sup 2。它是建立在一个2 μ m的CMOS n阱工艺和芯片使能访问时间为200ns。作者还演示了一种位并行结构,其中电容器的公共板与位线平行,并连接给定列中的所有位。给出了该器件的典型特性
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A 16 kb ferroelectric nonvolatile memory with a bit parallel architecture
The authors describe an experimental 16-kb nonvolatile memory using two memory cells per bit with one transistor and one ferroelectric capacitor per memory cell. The RAM measures 5 mm*7 mm with 462 mu m/sup 2/ per bit. It is built in a 2- mu m CMOS n-well process and has a chip-enable access time of 200 ns. The authors also demonstrate a bit-parallel architecture in which the common plate of the capacitors runs parallel to the bit lines and connects all bits in a given column. The typical characteristics of the device are given.<>
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