引入触发p-n二极管改善sbd嵌入式SiC mosfet的浪涌电流能力

T. Ohashi, H. Kono, S. Asaba, Hideki Hayakawa, Takahiro Ogata, R. Iijima
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引用次数: 1

摘要

在嵌入sbd的SiC mosfet中,我们试图提高浪涌电流能力,同时抑制导致长期可靠性问题的双极操作。通过结合触发p-n二极管来诱导电导率调制,我们预计可以在低电压下流过更高的电流,并且可以提高浪涌电流的能力。通过初步的TCAD仿真验证了该触发二极管的有效性,并制作了带有触发二极管的sbd嵌入式SiC mosfet。通过在触发二极管区域以与电池区域相同的间隔放置sdd,可以在没有双极操作的情况下保持最大电流密度。通过在整个芯片上分布3到4个相邻的触发二极管,电导率调制和热量产生被分散到整个芯片上,与没有触发二极管的sbd嵌入式SiC MOSFET相比,浪涌电流能力提高了1.43倍。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Improvement of Surge Current Capability in SBD-embedded SiC MOSFETs by Introducing Trigger p-n Diodes
In SBD-embedded SiC MOSFETs, we attempted to improve the surge current capability while suppressing the bipolar operation that causes long-term reliability problems. By incorporating trigger p-n diodes that induce conductivity modulation, we expected that higher current could flow with a low voltage and the surge current capability would be improved. The effectiveness of the trigger diode was confirmed by preliminary TCAD simulation, and SBD-embedded SiC MOSFETs with trigger diodes were fabricated. By placing SBDs in the trigger diode region at the same intervals as in the cell region, maximum current density without bipolar operation was maintained. By distributing 3 to 4 adjacent trigger diodes over the entire chip, the conductivity modulation and heat generation were spread out over the entire chip, and the surge current capability was improved by 1.43 times compared with an SBD-embedded SiC MOSFET without trigger diodes.
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