{"title":"后退火对脉冲激光沉积zr0.8 sn0.2 tio4薄膜在Si(100)上的影响","authors":"C. Chuang, M. Shih, M. Weng","doi":"10.1117/12.814587","DOIUrl":null,"url":null,"abstract":"We demonstrate the pulse laser deposition (PLD) of zirconium tin titanium oxide (Zr0.8,Sn0.2)TiO4 (ZST) thin film on p-type Si (100)substrate by KrF excimer laser at room temperature, and the study of the effects of post-annealing to the optical and dielectric properties of the deposited ZST thin films. Deposition rate of ZST thin film at 0.3 Angstrom/pulse has been achieved with laser fluences of 1500 mJ/cm2. Raman spectroscopy, X-ray diffraction (XRD), and scanning electron microscopy (SEM) are used to study the effect of the crystalline properties of the deposited films on process parameters; such as laser fluence and annealing temperature. In addition, UV-Vis spectroscopy is used to characterize the optical properties of the deposited ZST films.","PeriodicalId":191475,"journal":{"name":"International Symposium on Laser Metrology","volume":"77 4 Pt 2 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2008-09-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"The effects of post-annealing on pulse laser deposition of Zr0.8Sn0.2TiO4thin film on Si(100)\",\"authors\":\"C. Chuang, M. Shih, M. Weng\",\"doi\":\"10.1117/12.814587\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We demonstrate the pulse laser deposition (PLD) of zirconium tin titanium oxide (Zr0.8,Sn0.2)TiO4 (ZST) thin film on p-type Si (100)substrate by KrF excimer laser at room temperature, and the study of the effects of post-annealing to the optical and dielectric properties of the deposited ZST thin films. Deposition rate of ZST thin film at 0.3 Angstrom/pulse has been achieved with laser fluences of 1500 mJ/cm2. Raman spectroscopy, X-ray diffraction (XRD), and scanning electron microscopy (SEM) are used to study the effect of the crystalline properties of the deposited films on process parameters; such as laser fluence and annealing temperature. In addition, UV-Vis spectroscopy is used to characterize the optical properties of the deposited ZST films.\",\"PeriodicalId\":191475,\"journal\":{\"name\":\"International Symposium on Laser Metrology\",\"volume\":\"77 4 Pt 2 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2008-09-29\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"International Symposium on Laser Metrology\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1117/12.814587\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Symposium on Laser Metrology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.814587","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
The effects of post-annealing on pulse laser deposition of Zr0.8Sn0.2TiO4thin film on Si(100)
We demonstrate the pulse laser deposition (PLD) of zirconium tin titanium oxide (Zr0.8,Sn0.2)TiO4 (ZST) thin film on p-type Si (100)substrate by KrF excimer laser at room temperature, and the study of the effects of post-annealing to the optical and dielectric properties of the deposited ZST thin films. Deposition rate of ZST thin film at 0.3 Angstrom/pulse has been achieved with laser fluences of 1500 mJ/cm2. Raman spectroscopy, X-ray diffraction (XRD), and scanning electron microscopy (SEM) are used to study the effect of the crystalline properties of the deposited films on process parameters; such as laser fluence and annealing temperature. In addition, UV-Vis spectroscopy is used to characterize the optical properties of the deposited ZST films.
求助内容：
应助结果提醒方式：
京公网安备 11010802042870号
