a-Si:H及其合金中局域态分布的透射后光电流分析

G. Adriaenssens
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引用次数: 1

摘要

在传统的非晶半导体飞行时间(TOF)实验中,用于测量瞬态光电流的三明治电池样品几何结构也可以用于测量远超过TOF传输时间的深阱载流子的发射。如果深度重陷或随机能量波动不主导响应,则可以从发射电流计算出状态密度分布。氢化非晶硅及其合金为该技术的可能性和问题提供了一系列的例子。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Post-transit photocurrent analysis of the distribution of localized states in a-Si:H and its alloys
The sandwich-cell sample geometry that is used for measuring the transient photocurrents in traditional time-of-flight (TOF) experiments in amorphous semiconductors, can also be used well beyond the TOF transit-time to measure the emission of charge carriers from deep traps. A density-of-states profile can then be calculated from the emission current, provided deep retrapping or random energy fluctuations do not dominate the response. Hydrogenated amorphous silicon and its alloys provide a full range of examples for the possibilities and problems of the technique.
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