边缘终端结构雪崩击穿对IGBT芯片有源部分的破坏

U. Knipper, F. Pfirsch, T. Raker, J. Niedermeyr, G. Wachutka
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引用次数: 3

摘要

对具有VLD边缘终止结构的IGBT芯片的模拟和测量表明,雪崩击穿状态下存在周期性的尖锐电流峰值序列。这些电流峰值是由动态调制的电场和局部自加热之间的相互作用引发和维持的电流灯丝过程引起的。这种机制使得IGBT芯片能够在短时间内承受大的雪崩电流。在厚度减小的器件中,我们观察到在IGBT芯片的有源部分发生了一种破坏机制,这是由边缘终端结构中的过量雪崩电流引起的。因此,为了最大可能的安全操作区域,IGBT芯片的边缘终端结构和位于有源区域的邻近单元必须重点进行设计优化。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Destruction in the Active Part of an IGBT Chip Caused by Avalanche-Breakdown at the Edge Termination Structure
Simulations and measurements on IGBT chips with a VLD edge termination structure reveal a periodic sequence of sharp current peaks in the avalanche breakdown regime. These current peaks are caused by a current filamentation process initiated and sustained by the interplay between a dynamically modulated electric field and localized self-heating. This mechanism makes it possible that the IGBT chip is capable of withstanding large avalanche-currents for a certain short period of time. In devices with decreased thickness we observe a destruction mechanism occurring in the active part of the IGBT chip, which is caused by the excessive avalanche-current in the edge termination structure. Consequently, for the largest possible safe-operating area, the edge termination structure and the neighboring cells located in the active area of an IGBT chip have to be focussed on for design optimization.
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