双栅极NCFET的陡阈下摆幅仿真研究

Mooli Shashank Reddy, Tejendra Dixit, K. P. Pradhan
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引用次数: 1

摘要

负电容场效应晶体管(ncfet)由于其低功耗应用而迅速受到关注。由于铁电(fe)层的反转(即放大)效应,ncfet升压氧化物和铁电电容之间的电压[1]。它们的设计方式使其亚阈值摆动克服了玻尔兹曼极限。根据玻尔兹曼定理,载流子要想穿过势垒并使电流增加十倍,至少需要增加60 mV的栅极电压[2]。本文提出了一种设计NCFETS的新方法,其目标是低亚阈值摆幅。通过双栅场效应管结构的实验数据验证了该模型的有效性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Steep Subthreshold Swing in Double Gate NCFET:A Simulation Study
The rapid increase in interest on Negative capacitance Field Effect Transistors(NCFETs) is due to its Low power applications. NCFETs stepsup the voltage between the oxide and ferroelectric capacitance due to reversing (i.e, amplification) effect of a ferroelectric (fe) layer[1]. These are designed in a way such that its Subthreshold swing overcomes the boltzmann limit. According to the Boltzmann theorem, carriers that can cross the barrier and increase current by a decade need a gate voltage increase of at least 60 mV[2]. This paper presents a new approach for designing NCFETS, where the target is a low subthreshold swing. The proposed model is validated against several experimental data for an double-gate FET architecture.
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