中性束自顶向下工艺制备砷化镓量子纳米盘阵列的光学特性

A. Rigo, T. Kiba, Y. Tamura, C. Thomas, I. Yamashita, A. Murayama, S. Samukawa
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引用次数: 0

摘要

基于III-V型化合物半导体的量子点光子器件以其低功耗、温度稳定、高速调制等优点成为备受关注的光电子器件。我们利用生物模板和中性束蚀刻技术,开发了一种无缺陷、自上而下的直径低于20纳米的GaAs量子纳米盘(NDs)制造工艺,并利用金属有机气相外延(MOVPE)再生的AlGaAs势垒中嵌入了4和8纳米厚的GaAs NDs。利用时间分辨光致发光光谱对其光学性质进行了表征。我们证实了发射能量和PL的瞬态行为作为温度的函数受到NDs的量子限制效应的强烈影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Optical characteristics of GaAs quantum nanodisks arrays by using neutral beam top-down process
Quantum dots (QDs) photonic devices based on III-V compound semiconductor are attractive optoelectronic devices due to their low power consumption, temperature stability, and high-speed modulation. We have developed a defect-free, top-down fabrication process for sub-20-nm-diameter GaAs quantum nanodisks (NDs) by employing a biotemplate and neutral beam etching and produced 4- and 8-nm-thick GaAs NDs embedded in an AlGaAs barrier regrown using metalorganic vapor phase epitaxy (MOVPE). The optical properties were characterized by using time-resolved photoluminescence spectroscopy. We confirmed that the emission energies and the transient behavior of the PL as a function of temperature were strongly affected by the quantum confinement effects of the NDs.
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