纳米定位装置非弹性位移响应的接触力学描述

Michael J. Starra, E. Reedy, Alex D. Corwina, R. Carpick, E. Flater
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引用次数: 4

摘要

建立了一个经典的力学模型来捕捉多晶硅和涂层多晶硅表面接触时预滑动切向偏转(PSTD)的存在。为了模拟粗糙摩擦,实验已经表明,并通过详细的有限元分析得到支持,摩擦力通过切向滑动尺度通过称为结强度的材料参数线性发展。结合离散准静态接触力学分析的结强度模型,利用AFM从实际多晶硅表面采样的接触表面描述,预测了与观察到的PSTD响应定性一致的非弹性切向位移。仿真结果表明,PSTD的存在不仅与接触面的空间特性有关,还与局部载荷特性有关。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Contact mechanics description of inelastic displacement response of a nano-positioning device
A classical mechanistic model was developed to capture the existence of pre-sliding tangential deflection (PSTD) in contacting polysilicon and coated polysilicon surfaces. For the purposes of modeling asperity friction, experiments have shown, and been supported through detailed finite element analyses, that frictional forces developed through tangential sliding scale linearly through a material parameter known as the junction strength. A junction strength model coupled with a discrete quasi-static contact mechanics analysis, using contacting surface descriptions sampled by AFM from actual polysilicon surfaces, predicts inelastic tangential displacements that are qualitatively consistent with observed PSTD response. The simulations imply that the existence of PSTD depends not only on the spatial characteristics of contacting surfaces, but also on the local loading characteristics.
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