用于DRAM保留诊断的电荷泵送

J. Adkisson, R. Divakaruni, J. Slinkman
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引用次数: 0

摘要

电荷泵送是分析亚微米mosfet界面态密度的一种有效方法。本质上,电荷泵浦是通过脉冲反转和积累之间的栅极来测量界面态密度的。通过在脉冲的反转部分填充带有少数载流子的陷阱,并在脉冲的积累部分允许少数载流子与多数载流子重组,在器件体内产生直流电流。电荷泵送电流的大小与脉冲数和界面态密度成正比。我们描述了使用电荷泵浦来诊断DRAM阵列的保留行为。这允许对DRAM阵列器件进行现场测试,因此可以直接与功能16mb DRAM芯片的电荷保留特性相关。该概念可扩展到任何DRAM单元。我们的目标是将电荷泵送电流与DRAM中的保留故障联系起来,为保留学习提供另一种诊断技术。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Charge pumping for DRAM retention diagnostic
Charge pumping is an effective technique used extensively to analyze the interface state density of submicron MOSFETs. In essence, charge pumping measures the interface state density by pulsing the gate between inversion and accumulation. By filling traps with minority carriers in the inversion portion of the pulse, and allowing the minority carriers to recombine with majority carriers during the accumulation portion of the pulse, a DC current is generated in the body of the device. The magnitude of the charge-pumping current is then proportional to the number of pulses and the interface state density. We describe the use of charge pumping to diagnose retention behavior of DRAM arrays. This allows in-situ testing of the DRAM array device and, therefore, direct correlation to charge-retention characteristics of the functional 16 Mb DRAM chip. The concept is extendible to any DRAM cell. Our goal here was to correlate the charge-pumping current with retention failures in a DRAM to provide another diagnostic technique for retention learning.
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