具有发射极隧道势垒和复合集电极结构的InP/InGaAs双异质结双极晶体管(DHBT)

W. Chiou, C. Chen, C. Wang, H. Chuang, X. Liao, K. Lee, S. Tsai, C. Lu, W. Liu
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引用次数: 0

摘要

研究并验证了一种新型具有未掺杂隧道势垒和复合集电极结构的InP/InGaAs双异质结双极晶体管(DHBT)的直流性能。由于空穴的质量滤波效应,可以用薄的InP隧穿势垒代替宽隙发射极。实验得到了极小的偏置电压为25 mV,击穿电压BV/sub CEO/为9.2 V。此外,突变结和/spl δ /掺杂结构可以有效地消除电子在基底-集电极异质结中传输时的载流子阻塞效应。同时,由于低表面复合,直流电流增益几乎与发射极的周长面积比无关。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
InP/InGaAs double heterojunction bipolar transistor (DHBT) with an emitter tunneling barrier and composite collector structure
The DC performances of a novel InP/InGaAs double-heterojunction bipolar transistor (DHBT) with the undoped tunneling barrier and composite collector structure are studied and demonstrated. Due to the mass filtering effect for holes, a thin InP tunneling barrier can be used to replace the wide-gap emitter. Experimentally, an extremely small offset voltage of 25 mV and breakdown voltage BV/sub CEO/ of 9.2 V are obtained. Furthermore, the abrupt junction and /spl delta/-doping structure can eliminate the carrier blocking effect effectively when electrons are transported across the base-collector heterojunction. Meanwhile, the DC current gain is almost independent of the perimeter-to-area ratio of the emitter due to the low surface recombination.
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