f类和反f类放大器的门电压削波行为分析

Hiroshi Yamamoto, K. Kikuchi, N. Ui, Kazutaka Inoue, V. Vadalà, G. Bosi, A. Raffo, G. Vannini
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引用次数: 1

摘要

本文描述了饱和状态下F类和反F类$(\mathbf{F}^{-1})$运算时栅极削波行为对漏极效率的影响。采用简化的晶体管模型进行了数值分析。因此,我们已经证明$\mathbf{class}-\mathbf{F}^{-1}$运算的限制因素是栅极二极管导通而不是膝电压。另一方面,f类PA受到膝关节电压效应的限制。此外,在GaN HEMT上进行的非线性测量支持了我们的分析结果。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Analysis of Gate-Voltage Clipping Behavior on Class-F and Inverse Class-F Amplifiers
This paper describes the influence of gate-voltage clipping behavior on drain efficiency in case of class-F and inverse class-F $(\mathbf{F}^{-1})$ operations under saturated regime. Numerical analysis using a simplified transistor model was carried out. As a result, we have demonstrated that the limiting factor for $\mathbf{class}-\mathbf{F}^{-1}$ operation is the gate-diode conduction rather than knee voltage. On the other hand, class-F PA is restricted by the knee voltage effects. Furthermore, nonlinear measurements carried out on a GaN HEMT support our analytical results.
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