用于EUV光刻的无碎片高转换效率腔限等离子体光源的研究

Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387) Pub Date : 2000-07-11 DOI:10.1109/IMNC.2000.872765

T. Tomie, T. Aota, Y. Kurashima, N. Kandaka, H. Yashiro, K. Nishigori, I. Matsushima, M. Komuro

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引用次数: 4

摘要

我们提出了一种腔限型激光等离子体，作为一种无碎片和高转换效率的极紫外光刻光源。我们的想法是为了充分利用固体靶比气体靶具有更高的转换效率和更容易的波长可调性。为了克服碎片问题，提出了两种方法，即利用超短脉冲辐照对固体表面进行烧蚀，以及利用靶体的空腔结构提高烧蚀质量密度。本文报道了腔约束效应和高效EUV发射的初步实验评价。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Study of a cavity-confined plasma as a debris-less and high conversion efficiency source for EUV lithography

We are proposing a cavity-confined type laser-produced plasma as a debris-less and high conversion efficiency source for EUV lithography. Our idea is devised in order to make the best use of solid target having higher conversion efficiency and easier wavelength tunability than gas targets. In order to overcome the debris problem, two contrivances are made, i.e., ablation of the solid surface by the irradiation of an ultrashort pulse, and enhancement of the ablated mass density by the cavity structure of the target. Preliminary experimental evaluation of the cavity confinement effect and high efficiency EUV emission are reported.

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Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387)

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