高速率(>0.5 nm/s)等离子体沉积a-SiN/sub x/:H钝化性能的结构膜特性

J. Hong, W. Kessels, W. Soppe, H. Rieffe, A. Weeber, M. V. D. van de Sanden
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引用次数: 4

摘要

本文研究了与硅太阳电池金属化烧制相对应的短高温步骤对高速率(>0.5 nm/s)等离子体沉积a- sin /sub x/:H薄膜结构和光学性能的影响。采用(i) N/sub 2/-SiH/sub 4/膨胀热等离子体、(ii) NH/sub 3/-SiH/sub 4/膨胀热等离子体和(iii) NH/sub 3/-SiH/sub 4/微波等离子体制备了三种不同类型的a- sin /sub x/:H薄膜。利用弹性反冲检测、椭偏光谱和傅里叶变换红外光谱等方法研究了高温步进前后薄膜结构和光学性能的变化。高温步进导致薄膜的氢含量、质量密度和光学性质发生显著变化,富si薄膜的这些热诱导效应比富n薄膜的更强。研究发现,薄膜的高密度和热稳定性是获得良好体钝化性能的关键。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Structural film characteristics related to the passivation properties of high-rate (>0.5 nm/s) plasma deposited a-SiN/sub x/:H
This paper addresses the effects of a short high-temperature step, corresponding to the firing of the metallization on Si solar cells, on the structural and optical properties of high-rate (>0.5 nm/s) plasma deposited a-SiN/sub x/:H films. Three different types of a-SiN/sub x/:H films were prepared using (i) a N/sub 2/-SiH/sub 4/ expanding thermal plasma, (ii) a NH/sub 3/-SiH/sub 4/ expanding thermal plasma, and (iii) a NH/sub 3/-SiH/sub 4/ microwave plasma. The changes in structural and optical properties of the films have been investigated before and after the high temperature step by means of elastic recoil detection, spectroscopic ellipsometry, and Fourier transform infrared spectroscopy. The high temperature step induces significant changes in hydrogen content, mass density, and optical properties of the films and these thermally induced effects are more enhanced for Si-rich films than for N-rich films. It is found that a high density and thermal stability of the as-deposited films are crucial for obtaining good bulk passivation properties.
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