具有LiNbO3和LiTaO3压电物质层的单晶FBAR

Y. Osugi, T. Yoshino, K. Suzuki, T. Hirai
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引用次数: 39

摘要

薄膜体声谐振器(以下简称FBAR)已被提出用于高性能滤波器。通过使用薄膜沉积工艺,FBAR由一个声学谐振器组成。另一方面,单晶由于材料均匀性好、材料缺陷率低、材料稳定性高等特点,被广泛应用于谐振器材料。利用单晶实现高频谐振器将进一步扩大FBAR的应用范围。本文提出了一种具有低损耗、高带宽的单晶FBAR。此外,该器件还具有以下特点:能够利用单晶微加工技术,如单晶晶圆结、抛光和蚀刻,制造单晶声学谐振器;并且具有广泛的所需滤波器带宽的能力,每个滤波器都能够通过改变单晶的类型和方向来确保大量的高性能特性。单晶采用具有较大机电耦合系数kt2的LiNbO3 (LN)和LiTaO3 (LT)。3英寸全晶圆加工,从而产生卓越的均匀性谐振器。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Single crystal FBAR with LiNbO3 and LiTaO3 piezoelectric substance layers
The film bulk acoustic resonator (hereinafter referred to as FBAR) has been proposed for use as a high performance filter. FBAR consists of an acoustic resonator through use of a thin film deposition process. On the other hand, single crystals have been widely utilized as material for resonators due to their material uniformity, low material defect rates, and high material stability. The use of a single crystal to achieve a high frequency resonator will further expand FBAR's application ranges. In this paper, we present single crystal FBAR that is characterized by low loss and high bandwidth. Additionally, this device has the following features: the capability to fabricate a single crystal acoustic resonator through the use of single crystal micro processing technology, such as a single crystal wafer junction, polishing, and etching; and the capability of a wide range of desired filter bandwidths, each able to secure an ample amount of high performance characteristics by varying the single crystal's type and direction. LiNbO3 (LN) and LiTaO3 (LT), each with the large electromechanical coupling factor kt2, are used for the single crystal. 3-inch full-wafer processing is performed, thereby yielding superior uniformity resonators.
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