{"title":"先进半导体光刻胶专利信息公开的技术趋势与特点","authors":"Kosuke Watahiki, Y. Midoh, Kazuya Okamoto","doi":"10.1109/ISSM55802.2022.10027038","DOIUrl":null,"url":null,"abstract":"This paper focuses on advanced semiconductor photoresists and analyzes the patent data from the following four perspectives: relationship between semiconductor trends and resists; profit gains of the photoresist industry; advanced extreme ultraviolet lithography trends and sustainable development goals (SDGs); and patent quality and filing trends for photoresists. As a result, we obtain the trend of semiconductor photoresists accurately reflecting miniaturization and its relation to SDGs. In addition, a guideline for patent quality and information disclosure characteristics is obtained. Photoresist is a crucial component of the semiconductor industry in miniaturization, and patents are an effective application tool for the trend investigation.","PeriodicalId":130513,"journal":{"name":"2022 International Symposium on Semiconductor Manufacturing (ISSM)","volume":"65 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2022-12-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Technology Trends and Characteristics of Patent Information Disclosure in Advanced Semiconductor Photoresist\",\"authors\":\"Kosuke Watahiki, Y. Midoh, Kazuya Okamoto\",\"doi\":\"10.1109/ISSM55802.2022.10027038\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper focuses on advanced semiconductor photoresists and analyzes the patent data from the following four perspectives: relationship between semiconductor trends and resists; profit gains of the photoresist industry; advanced extreme ultraviolet lithography trends and sustainable development goals (SDGs); and patent quality and filing trends for photoresists. As a result, we obtain the trend of semiconductor photoresists accurately reflecting miniaturization and its relation to SDGs. In addition, a guideline for patent quality and information disclosure characteristics is obtained. Photoresist is a crucial component of the semiconductor industry in miniaturization, and patents are an effective application tool for the trend investigation.\",\"PeriodicalId\":130513,\"journal\":{\"name\":\"2022 International Symposium on Semiconductor Manufacturing (ISSM)\",\"volume\":\"65 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2022-12-12\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2022 International Symposium on Semiconductor Manufacturing (ISSM)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ISSM55802.2022.10027038\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2022 International Symposium on Semiconductor Manufacturing (ISSM)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISSM55802.2022.10027038","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Technology Trends and Characteristics of Patent Information Disclosure in Advanced Semiconductor Photoresist
This paper focuses on advanced semiconductor photoresists and analyzes the patent data from the following four perspectives: relationship between semiconductor trends and resists; profit gains of the photoresist industry; advanced extreme ultraviolet lithography trends and sustainable development goals (SDGs); and patent quality and filing trends for photoresists. As a result, we obtain the trend of semiconductor photoresists accurately reflecting miniaturization and its relation to SDGs. In addition, a guideline for patent quality and information disclosure characteristics is obtained. Photoresist is a crucial component of the semiconductor industry in miniaturization, and patents are an effective application tool for the trend investigation.
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