{"title":"基于石墨烯抑制二次电子产率的一般途径","authors":"Guibai Xie, W. Cui, Jing Yang","doi":"10.1109/ANTEM.2016.7550131","DOIUrl":null,"url":null,"abstract":"Secondary electron yield suppression is of great importance for high power microwave components in satellite. Great efforts have been made to find an easy and effective way to suppress the secondary electron emission process. However, it's still a challenge. In this paper we report a new approach for secondary electron emission suppression which can realize reducing the secondary electron yield from 2.12 to 1.09. Compared with the traditional techniques, this approach makes use of graphene which is deposited by remote plasma enhanced chemical vapor deposition on the surface of the components to realize the suppression of the secondary emission. Raman spectroscopy was used to character the quality of graphene. The nano-membrane of grapheme further enhances the suppression effect and contributes little to the insertion loss of the surface. Our technique shows great potential in space applications.","PeriodicalId":447985,"journal":{"name":"2016 17th International Symposium on Antenna Technology and Applied Electromagnetics (ANTEM)","volume":"47 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2016-07-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"6","resultStr":"{\"title\":\"A general route towards secondary electron yield suppression based on graphene\",\"authors\":\"Guibai Xie, W. Cui, Jing Yang\",\"doi\":\"10.1109/ANTEM.2016.7550131\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Secondary electron yield suppression is of great importance for high power microwave components in satellite. Great efforts have been made to find an easy and effective way to suppress the secondary electron emission process. However, it's still a challenge. In this paper we report a new approach for secondary electron emission suppression which can realize reducing the secondary electron yield from 2.12 to 1.09. Compared with the traditional techniques, this approach makes use of graphene which is deposited by remote plasma enhanced chemical vapor deposition on the surface of the components to realize the suppression of the secondary emission. Raman spectroscopy was used to character the quality of graphene. The nano-membrane of grapheme further enhances the suppression effect and contributes little to the insertion loss of the surface. Our technique shows great potential in space applications.\",\"PeriodicalId\":447985,\"journal\":{\"name\":\"2016 17th International Symposium on Antenna Technology and Applied Electromagnetics (ANTEM)\",\"volume\":\"47 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2016-07-10\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"6\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2016 17th International Symposium on Antenna Technology and Applied Electromagnetics (ANTEM)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ANTEM.2016.7550131\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2016 17th International Symposium on Antenna Technology and Applied Electromagnetics (ANTEM)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ANTEM.2016.7550131","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
A general route towards secondary electron yield suppression based on graphene
Secondary electron yield suppression is of great importance for high power microwave components in satellite. Great efforts have been made to find an easy and effective way to suppress the secondary electron emission process. However, it's still a challenge. In this paper we report a new approach for secondary electron emission suppression which can realize reducing the secondary electron yield from 2.12 to 1.09. Compared with the traditional techniques, this approach makes use of graphene which is deposited by remote plasma enhanced chemical vapor deposition on the surface of the components to realize the suppression of the secondary emission. Raman spectroscopy was used to character the quality of graphene. The nano-membrane of grapheme further enhances the suppression effect and contributes little to the insertion loss of the surface. Our technique shows great potential in space applications.