90nm CMOS漏极电流热噪声与射散噪声比的测量与建模

Yan Cui, G. Niu, A. Rezvani, S. S. Taylor
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引用次数: 8

摘要

本文介绍了90纳米CMOS技术中漏极电流热噪声的实验测量和建模,重点研究了其对电流的依赖关系。我们首次展示了实验证据,证明弱反转中的漏极电流噪声确实是弹状的(2ql)。在饱和状态下,漏极电流噪声主要由漏极电流决定,对漏极电压的依赖性较弱。推导了一个简单的噪声模型,并与实测数据进行了比较。该模型可以仅从直流I-V曲线进行噪声估计,并且与PMOS的测量结果非常一致,并且与NMOS的测量结果一致。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Measurement and Modeling of Drain Current Thermal Noise to Shot Noise Ratio in 90nm CMOS
We present here experimental measurement and modeling of drain current thermal noise in a 90 nm CMOS technology, with a focus on its current dependence. For the first time we show experimental evidence that drain current noise in weak inversion is indeed shot-like (2ql). In saturation, drain current noise is mainly determined by the drain current, and only weakly dependent on the drain voltage. A simple model of noise is derived and compared with data. The model enables noise estimation from only DC I-V curves, and yields excellent agreement with measurement for PMOS, and acceptable agreement for NMOS.
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