超低功耗应用的隧道场效应晶体管通管逻辑

Sung Hwan Kim, Z. Jacobson, P. Patel, C. Hu, T. Liu
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引用次数: 9

摘要

提出了基于锗源隧道场效应晶体管的通管逻辑门,并通过混合模式模拟对其进行了基准测试,用于15nm LG。对于低吞吐量应用(>100 ps栅极延迟),TPTL有利于降低动态能量和泄漏功率。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Tunnel FET-based pass-transistor logic for ultra-low-power applications
Germanium-source tunnel-FET-based pass-transistor logic gates are proposed and benchmarked against conventional CMOS logic gates via mixed-mode simulations, for 15 nm LG. For low throughput applications (>100 ps gate delay), TPTL is advantageous for reductions in dynamic energy and leakage power.
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