90nm块体CMOS工艺中单事件诱导电荷共享的缓解技术

O. Amusan, L. Massengill, M. Baze, Bharat L. Bhuva, A. Witulski, J. D. Black, A. Balasubramanian, M. C. casey, Deborah Black, J. Ahlbin, Robert A. Reed, M. W. McCurdy
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引用次数: 51

摘要

提出了缓解技术,以减少与90 nm DICE锁存器中电荷共享相关的增加的SEU横截面。增加的误差截面是由依赖于离子矢量方向性的重离子角冲击引起的,从而加剧了多个电路节点之间的电荷共享。与传统布局相比,使用节点分离作为缓解技术显示出加厚截面减少了一个数量级,而使用保护环对加厚截面没有明显影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Mitigation techniques for single event induced charge sharing in a 90 nm bulk CMOS process
Mitigation techniques to reduce the increased SEU cross-section associated with charge sharing in a 90 nm DICE latch are proposed. The increased error cross-section is caused by heavy ion angular strikes depending on the directionality of the ion vector, thereby exacerbating charge sharing among multiple circuit nodes. The use of nodal separation as a mitigation technique shows an order of magnitude decrease on upset cross-section compared to a conventional layout and the use of guard-rings show no noticeable effect on upset cross-section.
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