硅纳米突起的电子场发射

M. Tabe, K. Sawada, Y. Ishikawa, M. Ishida
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引用次数: 0

摘要

近年来,各种纳米结构材料(如碳纳米管和多孔硅)的电子增强场发射已被广泛研究用于显示器和其他真空电子器件。在这项工作中,我们利用无栅电极的二极管实验装置,研究了最基本的Si纳米结构的场发射电子,即垂直和横向尺寸为10/spl sim/20 nm,密度为3/spl sim/5/spl倍/10/sup 11/ cm/sup -2/的Si纳米突出物。这些突出物是由我们最初的自组织选择性氧化技术制造的,称为“纳米locos”。虽然Si突出物很小,但在低阳极电压下,根据氧化条件控制的微观形状,可以检测到高发射电流。这一结果鼓励我们利用硅纳米系统开发“明亮”和“高功能”的电子发射器件。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Electron field emission from silicon nanoprotrusions
Recently, enhanced field emission of electrons from a variety of nanostructured materials such as carbon nanotubes, and porous Si has been extensively studied for application to displays and other vacuum electronic devices. In this work, we have studied field emission of electrons by using a diode experimental setup without gate electrodes from the most fundamental Si nanostructure, i.e., Si nanoprotrusions with both vertical and lateral sizes of 10/spl sim/20 nm and the density of 3/spl sim/5/spl times/10/sup 11/ cm/sup -2/. The protrusions were fabricated by our original self-organized selective oxidation technique, referred to as "nano-LOCOS". Although the Si protrusions were quite small, high emission current was detected at low anode voltages, depending on the microscopic shape controlled by oxidation conditions. This result encourages us to develop "bright" and "highly functional" electron emitting devices using the Si nanosystem.
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