应用TRIZ算法解决了新、易副产物的问题

Chen Guan-ting, Chou Ming-Kuan, Huang Kuo-Chan, Lu Chien-Hui, Tseng Yun-Chieh, Chao Chia-chi
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引用次数: 0

摘要

本研究采用TRIZ创新方法,包括技术矛盾模型、物理矛盾模型和非对称-预作用-嵌套-提取原理的创新理论,对扩散机的Lamp退火工艺进行优化设计和改进。本发明实施例包括以下四部分:加入晶圆预清洁步骤2。2、改变吹气孔设计;3、改变进气口设计;调整腔室结构(图5)。上述2-3部分是需要实施的关键发明,将改变气流,彻底减少汽化副产物的附着。第1部分和第4部分是可选的,可以更有效地减少附着力。此外,对气流速率分布的模拟表明,气流速度的分布是可以改变的,从顶部到底部会产生一个逐渐变快的气流。靠近后部的晶圆片的出气可以在保持上部原有气流分布的情况下被下部气流排出。本发明减少了汽化副产物附着石英的概率,减轻了晶圆表面热效应,使工艺达到稳定,机器正常运行时间大幅提高。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
The application of TRIZ algorithm solve the problem of byproduct Hsin, Yi-Fang
The research used TRIZ innovation methodology which included the model of the technical contradictions, physical contradictions, and the inventive theory of asymmetry — preliminary action · nesting — extraction principles, to optimize the design and improve the Lamp anneal process of diffusion machine. The inventive embodiment consisted of the following four parts as: 1. Add the wafer Pre-clean step, 2. Change the design of blowing ports, 3. Change the design of air inlet, 4. Adjust the structure of the chamber (Figure 5). Above part 2–3 are key inventions to be implemented and will change the air flow to reduce the adhersion of vaporized byproduct completedly. Part 1 & 4 are optional to improve the reduction of adhersion more effectively. In addition, the simulation of airflow rate distribution manifested that the distribution of flow velocity could be changed and produced a gradually higher speed airflow from the top to the bottom. The out-gassing of the wafer near the backside could be expelled by the airflow of lower area while keeping original airflow distribution of upper area. The invention reduced the probability of vaporized byproduct adhering to the quartz and lessen the wafer surface thermal effect, so that the process reached stability and machine up-time was soaring.
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