p栅极氮化镓hemt在兆赫以下高频开关中的过电压耐用性和动态击穿电压

Ruizhe Zhang, Q. Song, Qiang Li, Yuhao Zhang
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引用次数: 5

摘要

在许多电源应用中,都需要电源器件的浪涌能量和过电压坚固性。对于GaN高电子迁移率晶体管(HEMT),一种没有雪崩能力的器件,其浪涌能量和过电压坚固性都取决于其瞬态击穿电压(BV),该电压最近被发现是动态的(即时间和频率相关)。然而,在以往的过电压研究中,开关频率($F_{\text{SW}}$)只有几千赫兹。这项工作首次开发了一个高压GaN hemt的测试平台,可以使用高达1 MHz的Fsw进行连续过压切换。在1 MHz过压开关下测试了两种类型的600/650 v商用p栅GaN hemt。两者都表现出良好的坚固性。栅极注入晶体管的动态BV几乎与F_{\text{SW}}$无关,而肖特基型p-栅极GaN HEMT在F_{\text{SW}}$较高时动态BV减小,例如Fsw从2 kHz增加到1 MHz时动态BV降低270 v。这些行为可以用两种GaN hemt的缓冲捕获/解除捕获来解释,并通过TCAD模拟进行了验证。这项工作揭示了GaN hemt在高频变换器中的真正过电压裕度。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Overvoltage Ruggedness and Dynamic Breakdown Voltage of P-Gate GaN HEMTs in High-Frequency Switching up to Megahertz
Surge-energy and overvoltage ruggedness of power devices are desired in many power applications. For the GaN high-electron-mobility transistor (HEMT), a device without avalanche capability, its surge-energy and overvoltage ruggedness are both determined by its transient breakdown voltage (BV), which was recently found to be dynamic (i.e., time- and frequency-dependent). However, the switching frequency ($F_{\text{SW}}$) in previous overvoltage studies is only a few kilohertz. This work, for the first time, developed a testbed for high-voltage GaN HEMTs enabling continuous overvoltage switching with a Fsw up to 1 MHz. Two types of 600/650-V commercial p-gate GaN HEMTs were tested under 1 MHz overvoltage switching. Both of them showed good ruggedness. The gate injection transistor showed a nearly $F_{\text{SW}}$-independent dynamic BV, while the Schottky-type p-gate GaN HEMT showed a decreasing dynamic BV at higher $F_{\text{SW}}$, e.g., 270-V lower when Fsw increases from 2 kHz to 1 MHz. These behaviors were explained by the buffer trapping/de-trapping in two types of GaN HEMTs and were validated via TCAD simulation. This work unveils the true overvoltage margin of GaN HEMTs in high-frequency converters.
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