Amir Reza Ahmadi Mehr, Iman Madadi, A. Afzali-Kusha
{"title":"耐受随机掺杂波动的亚阈值SRAM单元","authors":"Amir Reza Ahmadi Mehr, Iman Madadi, A. Afzali-Kusha","doi":"10.1109/EDSSC.2010.5713673","DOIUrl":null,"url":null,"abstract":"In this paper, we propose a subthreshold SRAM cell tolerant to random dopant fluctuations. The proposed 12T structure has a lower power consumption and larger write and read SNMs. In addition, the read operation is performed differentially at a high read current. The improvements are obtained at the cost of additional area. In addition, the proposed cell adds one junction capacitance per cell to the bitlines. Using SOI/FINFET structures the added capacitance may be minimized. To evaluate the efficiency of the proposed cell structure, several parameters of SRAM and their variations under random dopant fluctuations are studied. In the study, different subthreshold SRAM structures are implemented and compared using a 32nm standard bulk MOSFET technology.","PeriodicalId":356342,"journal":{"name":"2010 IEEE International Conference of Electron Devices and Solid-State Circuits (EDSSC)","volume":"18 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2010-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"A subthreshold SRAM cell tolerant to random dopant fluctuations\",\"authors\":\"Amir Reza Ahmadi Mehr, Iman Madadi, A. Afzali-Kusha\",\"doi\":\"10.1109/EDSSC.2010.5713673\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this paper, we propose a subthreshold SRAM cell tolerant to random dopant fluctuations. The proposed 12T structure has a lower power consumption and larger write and read SNMs. In addition, the read operation is performed differentially at a high read current. The improvements are obtained at the cost of additional area. In addition, the proposed cell adds one junction capacitance per cell to the bitlines. Using SOI/FINFET structures the added capacitance may be minimized. To evaluate the efficiency of the proposed cell structure, several parameters of SRAM and their variations under random dopant fluctuations are studied. In the study, different subthreshold SRAM structures are implemented and compared using a 32nm standard bulk MOSFET technology.\",\"PeriodicalId\":356342,\"journal\":{\"name\":\"2010 IEEE International Conference of Electron Devices and Solid-State Circuits (EDSSC)\",\"volume\":\"18 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2010-12-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2010 IEEE International Conference of Electron Devices and Solid-State Circuits (EDSSC)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/EDSSC.2010.5713673\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2010 IEEE International Conference of Electron Devices and Solid-State Circuits (EDSSC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/EDSSC.2010.5713673","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
A subthreshold SRAM cell tolerant to random dopant fluctuations
In this paper, we propose a subthreshold SRAM cell tolerant to random dopant fluctuations. The proposed 12T structure has a lower power consumption and larger write and read SNMs. In addition, the read operation is performed differentially at a high read current. The improvements are obtained at the cost of additional area. In addition, the proposed cell adds one junction capacitance per cell to the bitlines. Using SOI/FINFET structures the added capacitance may be minimized. To evaluate the efficiency of the proposed cell structure, several parameters of SRAM and their variations under random dopant fluctuations are studied. In the study, different subthreshold SRAM structures are implemented and compared using a 32nm standard bulk MOSFET technology.