耐受随机掺杂波动的亚阈值SRAM单元

Amir Reza Ahmadi Mehr, Iman Madadi, A. Afzali-Kusha
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引用次数: 0

摘要

在本文中,我们提出了一个耐受随机掺杂波动的亚阈值SRAM单元。提出的12T结构具有更低的功耗和更大的读写snm。此外,读取操作在高读电流下进行差分。这些改进是以增加面积为代价的。此外,所提出的单元在每个单元的位线上增加了一个结电容。使用SOI/FINFET结构可以最小化附加电容。为了评估所提出的电池结构的效率,研究了SRAM的几个参数及其在随机掺杂波动下的变化。在研究中,采用32nm标准体MOSFET技术实现了不同的亚阈值SRAM结构并进行了比较。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A subthreshold SRAM cell tolerant to random dopant fluctuations
In this paper, we propose a subthreshold SRAM cell tolerant to random dopant fluctuations. The proposed 12T structure has a lower power consumption and larger write and read SNMs. In addition, the read operation is performed differentially at a high read current. The improvements are obtained at the cost of additional area. In addition, the proposed cell adds one junction capacitance per cell to the bitlines. Using SOI/FINFET structures the added capacitance may be minimized. To evaluate the efficiency of the proposed cell structure, several parameters of SRAM and their variations under random dopant fluctuations are studied. In the study, different subthreshold SRAM structures are implemented and compared using a 32nm standard bulk MOSFET technology.
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