发光硅纳米晶体的辐射缺陷

T. Korchagina, S. Cherkova, G. Kachurin
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引用次数: 0

摘要

在加速离子F通过研究层的条件下,研究了离子辐照对发光硅NC性能的影响。为了引入NC中的辐射缺陷,在10/sup 12/-10/sup 14/ cm/sup -2/的剂量范围内,用200 keV F/sup +/离子照射层。用PL对样品进行了表征,用HREM和拉曼光谱对样品的结构性质进行了表征。如图所示,对于PL淬火,在NC中有足够的单独位移(1-5个位移/NC)。然而,即使在超过PL淬火剂量约一个数量级(高达50位移/NC)的情况下,NC仍能保持晶体结构。在这样的剂量下,电子显微镜显示NC中有一个严重受损的晶格。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Radiation Defects in the Light - Emitting Silicon Nanocrystals
The influence of an ion irradiation on the properties of light-emitting silicon NC has been examined in conditions when accelerated ions F passed the studied layer through. For introduction of radiation defects in NC the layers were irradiated with 200 keV F/sup +/ ions within the dose range of 10/sup 12/-10/sup 14/ cm/sup -2/. The samples were characterized by PL, and their structural properties - by HREM and Raman spectroscopy. It is shown, that for PL quenching there is enough to create in NC individual displacements (1-5 displacement/NC). However NC retain crystal structure even at the doses exceeding the doses of PL quenching for about an order (up to 50 displacement/NC). At such doses the electron microscopy reveals in NC a heavily damaged lattice.
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